Abstract
Biaxial and chiral thin films formed by oblique vapour deposition are patterned using standard photolithography. In one example 5 μm wide half-wave plates are fabricated by reactive ion etching a biaxial silicon film.
- Record Identifier
- 9926518243601891
- Title
- Direct nanoengineering and lithographic patterning of optically anisotropic thin films
- Creators
- Ian HodgkinsonQi hong WuMatthew ArnoldRichard Blaikie
- Publication Details
- Microelectronic engineering, Vol.57, pp.833-836
- Academic Unit
- Physics
- Publisher
- Elsevier B.V
- Date published ; e-published
- 01/09/2001
- Language
- English
- Resource Type ; Subtype
- Journal article