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Effects of repeated etching cycles using 15% hydrochloric acid on enamel loss and relative attenuation coefficient in resin infiltration
Journal article   Open access   Peer reviewed

Effects of repeated etching cycles using 15% hydrochloric acid on enamel loss and relative attenuation coefficient in resin infiltration

Dayang Fadzlina Abang Ibrahim, Noren Nor Hasmun, Yih Miin Liew and Annapurny Venkiteswaran
Photodiagnosis and photodynamic therapy, Vol.45, 103989
01/02/2024
Handle:
https://hdl.handle.net/10523/19690

Abstract

Attenuation coefficient Enamel loss Hydrochloric acid Optical coherence tomography Resin infiltration
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Published (Version of record)CC BY-NC-ND V4.0 Open Access
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https://doi.org/10.1016/j.pdpdt.2024.103989View
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